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Computational Lithography to Enable Faster AI Development



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As applications for artificial intelligence are developing rapidly, the need for ever higher computational power to train massive datasets for AI puts a premium on chipmaking technology. Conventional photolithography is increasingly difficult as gate density increases on modern semiconductors, and single digit nanometer devices are more time-consuming and difficult to fabricate.

NVIDIA has developed a software package in collaboration with ASML, Synopsys and TSMC which is designed to run with Nvidia graphics processor units in a system that promises to eventually produce an order of magnitude faster wafer production. 2 nm devices are under study, which may represent the physics limit to PLC development with photolithography technology.

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#NVIDIA #AI #photolithography

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